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Phys. Rev. B 79, 045312 (2009) [10 pages]

Optical spectra and microscopic structure of the oxidized Si(100) surface: Combined in situ optical experiments and first principles calculations

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Katalin Gaál-Nagy, Andrei Incze, and Giovanni Onida
Dipartimento di Fisica, Università di Milano, European Theoretical Spectroscopy Facility (ETSF), and CNISM-CNR-INFM, via Celoria 16, I-20133 Milano, Italy

Yves Borensztein, Nadine Witkowski, and Olivier Pluchery
Institut des Nanosciences de Paris, CNRS and University Pierre and Marie Curie, Paris 6, 140 rue de Lourmel, 75015 Paris, France

Frank Fuchs and Friedhelm Bechstedt
Institut für Festkörpertheorie und Optik, Friedrich-Schiller-Universität, Max-Wein-Platz 1, D-07743 Jena, Germany

Rodolfo Del Sole
Dipartimento di Fisica, Università di Roma “Tor Vergata,” European Theoretical Spectroscopy Facility (ETSF), and CNR-INFM-SMC, via della Ricerca Scientifica, I-00133 Roma, Italy

Received 31 July 2008; revised 22 November 2008; published 21 January 2009

We have investigated the first stages of the room-temperature oxidation of the Si(100) surface combining experimental surface optical spectra with the results of ab initio calculations. High-resolution reflectance anisotropy spectra (RAS) and surface differential reflectance spectra (SDRS) have been measured for the clean surfaces and various exposures up to 183 L, which have been compared with calculated RAS and SDRS in the independent-particle approximation. Our results, yielding a consistent description of both RAS and SDRS, suggest the coexistence of different structural domains, whose weight changes smoothly with the oxygen exposure. The main oxidation mechanisms together with their occurrence versus coverage are discussed.

© 2009 The American Physical Society

URL:
http://link.aps.org/doi/10.1103/PhysRevB.79.045312
DOI:
10.1103/PhysRevB.79.045312
PACS:
78.68.+m, 73.20.−r, 78.40.−q