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Phys. Rev. B 78, 125329 (2008) [5 pages]

Structure of the GaP(001)-4×2-In surface investigated with LEED, STM, photoelectron spectroscopy, and ab initio calculations

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M. Shimomura1,*, D. Ichikawa1, G. P. Srivastava2, K. Z. Liu3, and Y. Fukuda1
1Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8011, Japan
2School of Physics, University of Exeter, Stocker Road, Exeter EX4 4QL, United Kingdom
3National Key Laboratory for Surface Physics and Chemistry, China Academy of Engineering Physics, Mianyang 621907, People’s Republic of China

Received 19 May 2008; revised 16 July 2008; published 30 September 2008

Surface structures at the initial stage of indium adsorption on GaP(001) are studied by low-energy electron diffraction (LEED), scanning tunneling microscopy (STM), photoelectron spectroscopy (PES), and ab initio calculations. After indium deposition on the P-rich GaP(001)-2×1 surface followed by annealing at 400–450 °C, ×4 LEED spots were observed along the [110] direction. STM images obtained after 400 °C annealing show a 4×2-In reconstruction with row and hump structures. PES result for the 4×2-In surface shows existence of In atoms in two different chemical environments; one with In-In bonding and the other with In surrounded by phosphorus atoms at the surface. These LEED, STM, and PES results are consistent with the ζ structure, which was proposed for cation-rich clean surfaces of III-V semiconductors containing arsenic or antimony. Several plausible models derived from the original ζ model are examined by first-principles calculations for the GaP(001)-4×2-In surface.

© 2008 The American Physical Society

URL:
http://link.aps.org/doi/10.1103/PhysRevB.78.125329
DOI:
10.1103/PhysRevB.78.125329
PACS:
68.35.B−, 79.60.−i

*romshimo@rie.shizuoka.ac.jp