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Phys. Rev. B 70, 161102(R) (2004) [4 pages]

Evidence for a structurally-driven insulator-to-metal transition in VO2: A view from the ultrafast timescale

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A. Cavalleri1,*, Th. Dekorsy2, H. H. W. Chong1, J. C. Kieffer3, and R. W. Schoenlein1
1Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California, USA
2Forschungszentrum Rossendorf, Dresden, Germany
3INRS énergie et matériaux, Université du Québec, Varennes, Québec, Canada

Received 4 September 2003; revised 1 July 2004; published 13 October 2004

We apply ultrafast spectroscopy to establish a time-domain hierarchy between structural and electronic effects in a strongly correlated electron system. We discuss the case of the model system VO2, a prototypical nonmagnetic compound that exhibits cell doubling, charge localization, and a metal-insulator transition below 340 K. We initiate the formation of the metallic phase by prompt hole photo-doping into the valence band of the low-T insulator. The insulator-to-metal transition is, however, delayed with respect to hole injection, exhibiting a bottleneck time scale, associated with the phonon connecting the two crystallographic phases. This structural bottleneck is observed despite faster depletion of the d bands and is indicative of important bandlike character for this controversial insulator.

© 2004 The American Physical Society

URL:
http://link.aps.org/doi/10.1103/PhysRevB.70.161102
DOI:
10.1103/PhysRevB.70.161102
PACS:
78.47.+p, 71.30.+h

*Corresponding author. Email address: ACavalleri@lbl.gov