Phys. Rev. B 69, 195414 (2004) [6 pages]Imperfect wetting of vapor-deposited thin films: Monte Carlo simulations and nucleation modelReceived 1 August 2003; revised 12 December 2003; published 25 May 2004 In this paper we discuss atomistic Monte Carlo simulations of thin film microstructure evolution. We discuss physical vapor deposition, and are primarily concerned with the nucleation and coalescence of three-dimensional islands and their effect on film morphology. We discuss some fundamental issues associated with thin film formation, together with an assessment of the sensitivity of the film morphology to the deposition conditions and materials properties. In order to allow rapid assessment of the deposition conditions, we propose a simple analytical model that retains most of the essential physical parameters and properties. © 2004 The American Physical Society URL:
http://link.aps.org/doi/10.1103/PhysRevB.69.195414
DOI:
10.1103/PhysRevB.69.195414
PACS:
68.55.-a
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