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Phys. Rev. B 68, 085323 (2003) [11 pages]

Schottky barrier heights at polar metal/semiconductor interfaces

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C. Berthod
DPMC, Université de Genève, 24 quai Ernest-Ansermet, CH–1211 Genève 4, Switzerland

N. Binggeli
International Center for Theoretical Physics (ICTP) and INFM DEMOCRITOS National Center, Strada Costiera 11, I–34014 Trieste, Italy

A. Baldereschi
Institut Romand de Recherche Numérique en Physique des Matériaux (IRRMA), CH–1015 Lausanne, Switzerland

Received 28 February 2003; published 22 August 2003

Using a first-principle pseudopotential approach, we have investigated the Schottky barrier heights of abrupt Al/Ge, Al/GaAs, Al/AlAs, and Al/ZnSe (100) junctions, and their dependence on the semiconductor chemical composition and surface termination. A model based on linear-response theory is developed, which provides a simple, yet accurate description of the barrier-height variations with the chemical composition of the semiconductor. The larger barrier values found for the anion-terminated surface than for the cation-terminated surface are explained in terms of the screened charge of the polar semiconductor surface and its image charge at the metal surface. Atomic-scale computations show how the classical image charge concept, valid for charges placed at large distances from the metal, extends to distances shorter than the decay length of the metal-induced-gap states.

© 2003 The American Physical Society

URL:
http://link.aps.org/doi/10.1103/PhysRevB.68.085323
DOI:
10.1103/PhysRevB.68.085323
PACS:
73.30.+y, 73.40.Ns