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Phys. Rev. B 67, 092509 (2003) [3 pages]

Doping dependence of chemical potential and entropy in hole- and electron-doped high-Tc cuprates

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T. Tohyama* and S. Maekawa
Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan

Received 4 November 2002; published 27 March 2003

We examine the thermodynamic properties of hole- and electron-doped cuprates by using the t-t-t-J model. We find that the chemical potential shows different doping dependence between the hole and electron dopings. Recent experimental data of the chemical potential shift are reproduced except for lightly underdoped region in the hole doping where stripe and/or charge inhomogeneity are expected to be important. The entropy is also calculated as a function of the carrier concentration. It is found that the entropy of the electron-doped system is smaller than that of the hole-doped systems. This is related to a strong antiferromagnetic short-range correlation that survives in the electron-doped system.

© 2003 The American Physical Society

URL:
http://link.aps.org/doi/10.1103/PhysRevB.67.092509
DOI:
10.1103/PhysRevB.67.092509
PACS:
74.25.Bt, 71.10.Fd, 74.72.Dn

*Electronic address: tohyama@imr.tohoku.ac.jp; URL: http://www.maekawa-lab.imr.tohoku.ac.jp/