Phys. Rev. B 66, 174420 (2002) [5 pages]

Reorientation of magnetic anisotropy in obliquely sputtered metallic thin films

Abstract

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A. Lisfi^1,*, J. C. Lodder^1,†, H. Wormeester², and B. Poelsema²
¹SMI, MESA⁺ Research Institute, University of Twente, P.O. Box 217, 7500 AE Enschede, The Netherlands
²Faculty of Applied Physics and MESA⁺ Research Institute, University of Twente, P.O. Box 217, 7500 AE Enschede, The Netherlands

Received 3 September 2002; published 12 November 2002

Reorientation in the magnetic anisotropy as a function of film thickness has been observed in Co-Ni and Co thin films, obliquely sputtered on a polyethylene terephthalate substrate at a large incidence angle (70°). This effect is a consequence of the low magnetocrystalline anisotropy of the films (fcc structure of Co) and changes in microstructure from nuclei to columns according to the thickness. The critical thickness for this transition was estimated to be 30 nm for Co-Ni.

URL:

http://link.aps.org/doi/10.1103/PhysRevB.66.174420

DOI:

10.1103/PhysRevB.66.174420

PACS:

75.30.Gw, 81.15.-z

^*Present address: Morgan State University, Department of Physics, 1700 E. Cold Spring Lane, Baltimore, MD 21251.

^†Corresponding author. FAX: +31-53-489-3343. Electronic address: j.c.lodder@el.utwente.nl

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Phys. Rev. B 66, 174420 (2002) [5 pages]

Reorientation of magnetic anisotropy in obliquely sputtered metallic thin films