Phys. Rev. B 64, 125411 (2001) [5 pages]Surface roughening in low-pressure chemical vapor depositionReceived 1 May 2001; revised 18 June 2001; published 10 September 2001 We examine, using (2+1)-dimensional Monte Carlo simulations, the roughening behavior of a reemission model for chemical vapor deposition. We find that, for pure first-order reemission, the interface roughens logarithmically with time and that the scaling exponents are, for most sets of conditions, close to the exponents of the Edwards-Wilkinson model (α=0, β=0, and z=2). We compare our results to experimental results on chemical vapor deposition. © 2001 The American Physical Society URL:
http://link.aps.org/doi/10.1103/PhysRevB.64.125411
DOI:
10.1103/PhysRevB.64.125411
PACS:
68.55.Jk, 05.40.-a, 05.45.-a, 68.35.Ct
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