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Phys. Rev. B 62, R10649–R10652 (2000)

Epitaxial growth of Cu on Cu(001): Experiments and simulations

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Itay Furman and Ofer Biham
Racah Institute of Physics, The Hebrew University, Jerusalem 91904, Israel

Jiang-Kai Zuo*, Anna K. Swan, and John F. Wendelken
Solid State Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831

Received 31 July 2000; published in the issue dated 15 October 2000

A quantitative comparison between experimental and Monte Carlo simulation results for the epitaxial growth of Cu/Cu(001) in the submonolayer regime is presented. The simulations take into account a complete set of hopping processes whose activation energies are derived from semiempirical calculations using the embedded-atom method. The island separation is measured as a function of the incoming flux and the temperature. A good quantitative agreement between the experiment and simulation is found for the island separation, the activation energies for the dominant processes, and the exponents that characterize the growth. The simulation results are then analyzed at lower coverages, which are not accessible experimentally, providing good agreement with theoretical predictions as well.

© 2000 The American Physical Society

URL:
http://link.aps.org/doi/10.1103/PhysRevB.62.R10649
DOI:
10.1103/PhysRevB.62.R10649
PACS:
68.35.Fx, 68.55.-a, 82.20.Mj, 82.20.Wt

*Present address: Semiconductor Product Sector, Motorola, Inc., MD-M350, Mesa, AZ 85202.

Present address: Department of Electrical and Computer Engineering, Boston University, Boston, MA 02215.