Phys. Rev. B 57, 12324–12332 (1998)Andreev reflection in the fractional quantum Hall effectReceived 20 November 1997; published in the issue dated 15 May 1998 We study the reflection of electrons and quasiparticles on point-contact interfaces between fractional quantum Hall (FQH) states and normal metals (leads), as well as interfaces between two FQH states with mismatched filling fractions. We classify the processes taking place at the interface in the strong-coupling limit. In this regime a set of quasiparticles can decay into quasiholes on the FQH side and charge excitations on the other side of the junction. This process is analogous to an Andreev reflection in normal-metal/superconductor (N-S) interfaces. © 1998 The American Physical Society URL:
http://link.aps.org/doi/10.1103/PhysRevB.57.12324
DOI:
10.1103/PhysRevB.57.12324
PACS:
73.40.Hm, 71.10.Pm, 73.40.Gk, 73.23.-b
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