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Phys. Rev. B 53, 15421–15424 (1996)

Ab initio studies of adatom vacancies on the Si(111)-(7×7) surface

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H. Lim, K. Cho, R. B. Capaz, and J. D. Joannopoulos
Department of Physics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139

K. D. Brommer
Lockheed Sanders, Box 868, Nashua, New Hampshire 03051

B. E. Larson
Silicon Graphics Computer Systems, 1 Cavot Road, Hudson, Massachusetts 01749

Received 15 March 1996; published in the issue dated 15 June 1996

Ab initio total-energy calculations are used to investigate adatom vacancies on the Si(111)-(7×7) surface. In striking contrast to recent experimental estimates, vacancy formation energies are calculated to be 0.9 eV on average, with ∼0.1-eV variations depending on the type of adatom. We find that faulted or corner adatoms can be removed more easily than unfaulted or edge adatoms, respectively. Structural relaxations induce large changes in the electronic structure of the surface states. Calculation of scanning tunneling microscopy (STM) images show that the predicted variations should be readily observed in differential STM measurements. ©1996 The American Physical Society.

© 1996 The American Physical Society

URL:
http://link.aps.org/doi/10.1103/PhysRevB.53.15421
DOI:
10.1103/PhysRevB.53.15421
PACS:
68.35.Dv, 73.20.-r, 61.16.Ch