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Phys. Rev. B 52, 17231–17237 (1995)

Ab initio study of hydrogen adsorption on the Si(111)-(7×7) surface

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H. Lim, K. Cho, I. Park, and J. D. Joannopoulos
Department of Physics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139

Efthimios Kaxiras
Department of Physics and Division of Applied Sciences, Harvard University, Cambridge, Massachusetts 02138

See Also: Erratum

Received 12 May 1995; published in the issue dated 15 December 1995

First-principles total-energy pseudopotential calculations are performed to investigate the adsorption interaction of a H atom with dangling bonds on the Si(111)-(7×7) surface. The binding energies for adsorption of H at the adatom, rest atom, and corner hole sites are calculated to be 2.9, 3.2, and 3.5 eV, respectively. Spectral analysis of the electronic states shows that nonlocal changes of chemical reactivity are induced by charge transfer upon H adsorption. It is found that H adsorption on the adatoms or rest atoms induces a charge transfer onto the Si-H bond and a shift in energy of the remaining dangling-bond states. Adsorption on the corner hole, however, does not involve any charge transfer. The relationship between charge transfer and binding energies is discussed.

© 1995 The American Physical Society

URL:
http://link.aps.org/doi/10.1103/PhysRevB.52.17231
DOI:
10.1103/PhysRevB.52.17231
PACS:
73.20.At, 82.65.My, 68.55.Ln

See Also

Erratum: H. Lim, K. Cho, I. Park, J. D. Joannopoulos, and Efthimios Kaxiras, Erratum: Ab initio study of hydrogen adsorption on the Si(111)-(7×7) surface, Phys. Rev. B 54, 5179 (1996).