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Phys. Rev. B 48, 17867–17871 (1993)

Formation of the Ho/CdSe(101¯0) interface

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S. L. Molodtsov, M. Prietsch, C. Laubschat, and G. Kaindl
Institut für Experimentalphysik, Freie Universität Berlin, Arnimallee 14, D-14195 Berlin-Dahlem, Germany

A. V. Fedorov and V. K. Adamchuk
Institute of Physics, St. Petersburg State University, St. Petersburg 198904, Russia

Received 26 July 1993; published in the issue dated 15 December 1993

Auger-electron spectroscopy, Auger depth-profile analysis, as well as photoelectron spectroscopy give clear evidence for several stages in the formation of the Ho/CdSe(101¯0) interface. For Ho coverages lower than a critical thickness of ≃1 Å, no reaction or intermixing of the components was found. In the range of intermediate coverages, 2 Å<θ<20 Å, Ho-Se chemical reactions are observed leading to a release of Cd. For higher Ho coverages, θ≥20 Å, this stage changes to a regime that is characterized by considerable Cd segregation and surface metallization. The presence of this metallic Cd layer prevents Ho diffusion and inhibits Ho-Se chemical reaction upon further deposition of Ho.

© 1993 The American Physical Society

URL:
http://link.aps.org/doi/10.1103/PhysRevB.48.17867
DOI:
10.1103/PhysRevB.48.17867
PACS:
68.35.Fx, 73.30.+y, 79.60.-i