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Phys. Rev. B 37, 6521–6524 (1988)

Resistance fluctuations in multiprobe microstructures: Length dependence and nonlocality

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Harold U. Baranger
AT&T Bell Laboratories 4G-314, Holmdel, New Jersey 07733

A. Douglas Stone
Section of Applied Physics, Yale University, Box 2157, New Haven, Connecticut 06520

David P. DiVincenzo
IBM Thomas J. Watson Research Center, Box 218, Yorktown Heights, New York 10598

Received 7 January 1988; published in the issue dated 15 April 1988

We study numerically the resistance fluctuations, δR, in a disordered metallic microstructure with several probes within a single quantum coherent region. The strong influence of the probes causes δR to depend on the geometry of the coherent region. In a particular four-probe structure, δR is only weakly dependent on the voltage probe separation, in agreement with experiment, while the strong dependence of δR on separation in other structures should be experimentally observable. Nonlocal fluctuations decay slowly as the distance between the current path and voltage probes increases.

© 1988 The American Physical Society

URL:
http://link.aps.org/doi/10.1103/PhysRevB.37.6521
DOI:
10.1103/PhysRevB.37.6521
PACS:
72.15.Eb, 05.40.+j, 71.55.Jv, 73.50.Dn