Phys. Rev. B 21, 2108–2121 (1980)Effect of the central atom potential on the extended fine structure above appearance potential thresholdsReceived 5 September 1979; published in the issue dated 15 March 1980 The formalism previously given for describing the extended fine structure above appearance-potential-spectroscopy (APS) thresholds is extended by incorporating the effects of the excited "central" atom potential in an exact manner. The excitation-matrix elements are expressed in terms of the exact wave functions of the central atom potential. This introduces a "phase renormalization" into the excitation-matrix elements and eliminates a previously noted "phase difference" between single- and multiple-scattering calculations employing a plane-wave basis set. A series of approximations is then made which leads to an expression for the APS extended fine structure in terms of sinusoidal functions and hence provides a rationale for a Fourier-transform analysis. Simple model calculations assuming a constant "bare" excitation-matrix element, a spherically symmetric electronic density of states, and only S-wave scattering from the atomic cores are performed for a cluster of atoms having the atomic geometry of bulk vanadium. These calculations display the major predictions of the formalism and indicate that for a given system there may be some optimal energy range for data analysis. The problem of electron characteristic losses is considered, and it is pointed out that in the small-momentum-transfer limit the simple dipole selection rules appropriate to a photon-excitation process again apply. This may obviate many of the problems introduced by multiple angular momentum final states in the APS process. © 1980 The American Physical Society URL:
http://link.aps.org/doi/10.1103/PhysRevB.21.2108
DOI:
10.1103/PhysRevB.21.2108
PACS:
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